Industry Expert Blogs

In preparing for the Synopsys Users Group (SNUG) tutorial on “The Role of IP in More Moore and More than Moore”, I had to present the “dry run” yesterday to my colleagues. So this is what I’m presenting. Known as “more Moore”, high-k metal gate dielectrics, double patterning and finFET’s have extended Moore’s law to 14-nm. Targeting the next generation application processors for tablets and super smart phones, the benefits are performance, lower power and area. Typically at 65-nm and above, “More than Moore” – innovation occurs with integrated sensors and near field communication technologies in applications such as smart-posters and radio frequency identification. In both cases IP is required but has a different design requirement. Innovations such as 3D are also occurring. A detailed technical review of these technology innovations, the design and implementation challenges for analog and physical IP will be presented. I’ll be giving this tutorial on March  28th at  3pm at the Santa Clara Convention Center.

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