Industry Expert Blogs

Arm and Samsung Foundry, which have partnered for years on innovations in ultra-deep submicron process nodes, have announced a new milestone in their relationship: The first 7LPP (7nm Low Power Plus) and 5LPE (5nm Low Power Early) libraries for the long-anticipated extreme ultra-violet (EUV) lithography.

The announcement is the latest in a tremendously successful 12-year collaboration between Arm and Samsung Foundry, which has produced technologies and libraries starting at 65nm. Leveraging Arm’s unique IP integration capabilities, Samsung Foundry was able to use Arm physical and processor IP to validate the design readiness of their most advanced node.

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