Mosis offers IBM 90-nm process on MPW
(05/09/2006 3:13 PM EDT)
MUNICH, Germany — The Mosis integrated circuit fabrication service has begun offering multi-project wafer (MPW) runs on 90-nanometer process technologies from IBM, according to Paul Double, managing director of EDA Solutions Ltd.
EDA Solutions (Southampton, England) is the representative of Mosis in Europe.
The process is the 9SF process, which comes in three variants, low power digital, standard digital and analog and RF, said Double. The first customer submission deadline is Dec. 4, 2006, according to the Mosis website.
E-mail This Article | Printer-Friendly Page |
Related News
- IBM, Chartered Select Synopsys' Hi-Speed USB 2.0 and OTG PHYs for Their 90-nm Process Platform
- IBM, Sony, Toshiba tip 'Cell' processor at 90-nm
- SOI embedded DRAM running on Freescale 90-nm process
- Virage Logic First to Provide Silicon-Proven IP on TSMC Nexsys 90-nm Process
- Cypress Develops World's Highest-Density Networking SRAM On 90-nm Process Technology
Breaking News
- Rambus Reports Fourth Quarter and Fiscal Year 2024 Financial Results
- CoMira Solutions unveils its new 1.6T Ethernet UMAC IP
- intoPIX Unveils Cutting-Edge AV Innovations at ISE 2025
- RISC-V in Space Workshop 2025 in Gothenburg
- Dolphin Semiconductor strengthens its governance with two key Board appointments
Most Popular
- Intel Halts Products, Slows Roadmap in Years-Long Turnaround
- UK Space Agency Awards EnSilica £10.38m for Satellite Broadband Terminal Chips
- EXTOLL collaborates with BeammWave and GlobalFoundries as a Key SerDes IP Partner for Lowest Power High-Speed ASIC
- RaiderChip unveils its fully Hardware-Based Generative AI Accelerator: The GenAI NPU
- Celestial AI Announces Appointment of Semiconductor Industry Icon Lip-Bu Tan to Board of Directors