Mentor chief sees system design as main challenge
Kariyatil Krishnadas, EETimes
12/13/2010 8:42 PM EST
BANGALORE, India—System design will pose the main challenge to the EDA industry as a whole in the decade starting 2011, according to Mentor Graphics Corp. Chairman and CEO Walden Rhines, who added that his firm is amongst the better prepared EDA vendors to address this.Speaking at the annual Mentor international users meet here, Rhines said the 2000-2010 decade saw the largest growth areas being in design for manufacturing (DFM) and electronic system level (ESL) segments.
![]() |
E-mail This Article | ![]() |
![]() |
Printer-Friendly Page |
|
Related News
- Mentor's Rhines sees 'modest growth' in 2013
- Mentor Graphics Announces Scalable TLM-2.0 Design Flow Using Vista and Catapult C Synthesis Electronic System Level (ESL) Design Tools
- Dr. Walden Rhines Joins Cornami as President and CEO
- Mentor Nucleus RTOS extends system reliability for Arm Cortex v8-A 64-bit processors on multicore SoCs
- Mentor enables 64-bit ARM-v8 Cortex-A72 support in its Nucleus Real-Time Operating System
Breaking News
- intoPIX Powers Ikegami's New IPX-100 with JPEG XS for Seamless & Low-Latency IP Production
- Tower Semiconductor and Alcyon Photonics Announce Collaboration to Accelerate Integrated Photonics Innovation
- Qualcomm initiates global anti-trust complaint about Arm
- EnSilica Agrees $18m 7 Year Design and Supply ASIC Contract
- SiliconIntervention Announces Availability of Silicon Based Fractal-D Audio Amplifier Evaluation Board
Most Popular
- Qualcomm initiates global anti-trust complaint about Arm
- Siemens acquires Altair to create most complete AI-powered portfolio of industrial software
- Alphawave Semi Reveals Suite of Optoelectronics Silicon Products addressing Hyperscaler Datacenter and AI Interconnect Market
- EnSilica Agrees $18m 7 Year Design and Supply ASIC Contract
- Rapidus Announces Strategic Partnership with Quest Global to Enable Advanced 2nm Solutions for the AI Chip Era