Magma Delivers Hierarchical Reference Flow for the Common Platform Alliance's 32/28-nm Low-Power Process Technology

RTL-to-GDSII Flow Used to Successfully Implement Chip Using Latest ARM Artisan(R) 32/28-nm Process Libraries

SAN JOSE, Calif., Jan. 17, 2011  -- Magma® Design Automation (Nasdaq:LAVA), today announced the availability of a proven hierarchical RTL-to-GDSII reference flow for the Common Platform™ alliance's 32/28-nanometer (nm) low-power process technology. This reference flow leverages the Talus® IC implementation system's unique power optimization and management capabilities, the latest ARM Artisan® 32/28-nm LP process libraries and the Common Platform alliance's advanced 32/28-nm process technology to enable designers to reduce power, turnaround time and cost per die. 

The hierarchical reference design was implemented using Magma's Talus RTL-to-GDSII flow and the latest ARM Artisan® 32/28-nm LP libraries optimized for the Common Platform 32/28LP process libraries; standard cells, memory compilers and general-purpose IOs. This successful design implementation demonstrates that the flow provides key low-power design capabilities, including an automated multiple voltage-domain design methodology, validates tool and library interoperability and facilitates rapid user adoption through the inclusion of a sample design which can be accessed from Magma or the Common Platform alliance.

"The RTL-to-GDSII reference flow, combining Magma's software and the Common Platform alliance's 32/28-nm process technology, will enable our foundry customers to enjoy the benefits of power, performance and time to market for their advanced ICs," said Dr. K.M. Choi, vice president of the Infrastructure Design Center, System LSI, Samsung Electronics, on behalf of the Common Platform alliance.

"A large percentage of leading semiconductor companies are already using Talus for 32/28-nm designs, and the list is growing," said Premal Buch, general manager of Magma's Design Implementation Business Unit. "By working with the Common Platform alliance to develop this flow and reference design we reinforce our commitment to providing proven, effective 32/28-nm design solutions."

Magma Reference Flow for Common Platform alliance 32/28-nm Low-Power Process

The Magma Reference Flow for Common Platform alliance 32/28-nm Low-Power Process is an integrated RTL-to-GDSII reference flow that is based on Talus Design, Talus Vortex, Hydra™ and Talus Power Pro. It provides a comprehensive low-power hierarchical solution. Talus Design and Talus Vortex provide an advanced IC implementation solution that performs timing optimization concurrently during routing – rather than sequentially before and after place and route – providing faster overall design closure with better performance and predictability. Hydra is a hierarchical design planning solution for large systems on a chip (SoCs) and features out-of-the-box reference flows for enhanced ease of use and faster delivery of better floorplans. Talus Power Pro supports power optimization techniques required in low-power designs, including multiple voltage domains, which enable the optimal tradeoff between performance, area and power, and clock gating for dynamic power reduction. Talus Power Pro supports both the Unified Power Format (UPF) and Common Power Format (CPF) standards for power intent.

Magma will feature its reference flows for the Common Platform alliance 32/28-nm LP and 65-nm LPe processes at the Common Platform Technology Forum on Jan. 18, 2011 in Santa Clara. For more information about the Common Platform Technology Forum 2011, please visit: http://www.commonplatform.com/tf2011/.

Availability

The Magma Reference Flow for Common Platform alliance 32/28-nm Low-Power Process is available upon request from Samsung Electronics, GLOBALFOUNDRIES and Magma.

About the Common Platform

IBM, Samsung Electronics and GLOBALFOUNDRIES have forged a unique manufacturing collaboration, featuring 28-nm, 32-nm, 45-nm, 65-nm and 90-nm process technologies. By combining the expertise and research resources of all three companies and leveraging advances such as high-k metal gate technology, 193-nm immersion lithography and ultralow-k dielectrics, the Common Platform technology collaboration is able to accelerate the availability of leading-edge technology to foundry customers. The Common Platform model is supported by a comprehensive design-enablement ecosystem, enabling foundry customers to easily source their chip designs to multiple 300-mm foundries with minimal design work and with unprecedented flexibility and choice.

About Magma

Magma's electronic design automation (EDA) software provides the "Fastest Path to Silicon"™ and enables the world's top chip companies to create high-performance integrated circuits (ICs) for cellular telephones, electronic games, WiFi, MP3 players, digital video, networking and other electronic applications. Magma products are used in IC implementation, analog/mixed-signal design, analysis, physical verification, circuit simulation and characterization. The company maintains headquarters in San Jose, Calif., and offices throughout North America, Europe, Japan, Asia and India. Magma's stock trades on Nasdaq under the ticker symbol LAVA. Follow Magma on Twitter at www.Twitter.com/MagmaEDA and on Facebook at www.Facebook.com/Magma. Visit Magma Design Automation on the Web at www.magma-da.com.