450-mm fab schedule slips
Mark LaPedus, EETimes
1/24/2011 8:52 PM EST
SAN JOSE, Calif. – Despite a sudden surge in fab tool activity for the next-generation wafer size, 450-mm fabs will emerge later than sooner and the production target appears to have slipped.
This comes to no surprise to analysts, as the recent recession appears to have delayed 450-mm fab and tool investments. As reported, Intel, Samsung and TSMC have talked about having 450-mm prototype fabs by 2012. Intel Corp. is readying D1X, a 450-mm ''capable’’ fab. The new development fab in Oregon is slated for R&D startup in 2013.
![]() |
E-mail This Article | ![]() |
![]() |
Printer-Friendly Page |
Related News
Breaking News
- Breker RISC-V SystemVIP Deployed across 15 Commercial RISC-V Projects for Advanced Core and SoC Verification
- Veriest Solutions Strengthens North American Presence at DVCon US 2025
- Intel in advanced talks to sell Altera to Silverlake
- Logic Fruit Technologies to Showcase Innovations at Embedded World Europe 2025
- S2C Teams Up with Arm, Xylon, and ZC Technology to Drive Software-Defined Vehicle Evolution
Most Popular
- Intel in advanced talks to sell Altera to Silverlake
- Arteris Revolutionizes Semiconductor Design with FlexGen - Smart Network-on-Chip IP Delivering Unprecedented Productivity Improvements and Quality of Results
- RaiderChip NPU for LLM at the Edge supports DeepSeek-R1 reasoning models
- YorChip announces Low latency 100G ULTRA Ethernet ready MAC/PCS IP for Edge AI
- AccelerComm® announces 5G NR NTN Physical Layer Solution that delivers over 6Gbps, 128 beams and 4,096 user connections per chipset