450-mm fab schedule slips
Mark LaPedus, EETimes
1/24/2011 8:52 PM EST
SAN JOSE, Calif. – Despite a sudden surge in fab tool activity for the next-generation wafer size, 450-mm fabs will emerge later than sooner and the production target appears to have slipped.
This comes to no surprise to analysts, as the recent recession appears to have delayed 450-mm fab and tool investments. As reported, Intel, Samsung and TSMC have talked about having 450-mm prototype fabs by 2012. Intel Corp. is readying D1X, a 450-mm ''capable’’ fab. The new development fab in Oregon is slated for R&D startup in 2013.
![]() |
E-mail This Article | ![]() |
![]() |
Printer-Friendly Page |
Related News
Breaking News
- JEDEC® and Industry Leaders Collaborate to Release JESD270-4 HBM4 Standard: Advancing Bandwidth, Efficiency, and Capacity for AI and HPC
- BrainChip Gives the Edge to Search and Rescue Operations
- ASML targeted in latest round of US tariffs
- Andes Technology Celebrates 20 Years with New Logo and Headquarters Expansion
- Creonic Unveils Bold Rebrand to Drive Innovation in Communication Technologies
Most Popular
- Cadence to Acquire Arm Artisan Foundation IP Business
- AMD Achieves First TSMC N2 Product Silicon Milestone
- Why Do Hyperscalers Design Their Own CPUs?
- Siemens to accelerate customer time to market with advanced silicon IP through new Alphawave Semi partnership
- New TSN-MACsec IP core for secure data transmission in 5G/6G communication networks