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Intel sees quad-patterned path to 10 nm chips
Rick Merritt, EETimes
9/12/2012 11:00 PM EDT
SAN FRANCISCO – Intel Corp. has found a way to create a 10 nm process technology using immersion lithography. In addition, the processor giant is on track to start making chips in a 14 nm process technology before the end of next year, said an Intel fellow in a talk here.
The 10 nm process would debut in 2015 or later. It would require quadruple patterning for some mask layers but “it’s still economical,” said Mark Bohr, director of Intel’s technology and manufacturing group, speaking to EE Times after a talk at the Intel Developer Forum here.
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