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NeoPUF, A Reliable and Non-traceable Quantum Tunneling PUFBy Charles Hsu and MengYi Wu (PUFsecurity) PUF stands for “Physically Unclonable Function” and is a physically derived “fingerprint” that serves as a unique identity for semiconductor devices. Their properties depend on the uniqueness and randomness of the physical factors induced during the manufacturing stage of a chip. These physical variations are unpredictable and unclonable; that’s why PUFs are suitable to serve as a root of trust with security functions in devices. In practice, we could transfer those microvariations of PUFs into sequences that consists of 0 and 1 in order to be used as keys, identities, or nonce for advanced security functions. Since there are many ways to produce PUFs, there will also be many differences in its performance. Generally, PUFs can be evaluated by four dimensions including randomness, uniqueness, robustness and traceability as defined below:
SRAM PUF vs. NeoPUF: Mechanism and Performance Comparison Here is an example of the comparison between two well-known PUFs in the current market: SRAM PUF (Intrinsic ID) and NeoPUF (PUFsecurity/eMemory). An SRAM PUF is enabled by the local mismatch between the threshold voltage in a pair of MOSFETs to generate a positive feedback loop. The slight differences caused by the mismatch characteristics will be amplified and divided into 0 or 1 and stored in SRAM. A random value of either 0 or 1 results from the variations of the threshold voltage in the MOSFETs. However, the stability of an SRAM PUF’s extracted random value is seriously impacted by the following factors:
(For a more detailed explanation for SRAM , please refer to: https://blog.pufsecurity.com/2020/02/19/sram-puf-is-increasingly-vulnerable/) NeoPUF, invented by eMemory, is a PUF which extracts the variations in the quality of the intrinsic oxide to become a unique signature. It is well known fact that there are many silicon and oxygen dangling bonds in the gate oxide which act as a leakage pass for electrons. As the gate oxide gets thinner the electrons can tunnel through the thin oxide easily. It is also known that if the electrons gain enough energy, they can break si-o bonds and create more dangling bonds that enhance the electron tunneling. ([Ref] Hsu, C. C. H., & Sah, C. T. (1988). “Generation-annealing of oxide and interface traps at 150 and 298 K in oxidized silicon stressed by Fowler-Nordheim electron tunneling.” Solid-State Electronics, 31(6), 1003-1007.) As a result, we can take the advantages of these intrinsic microstructure differences to create the PUF number. To do so, we need to apply high electrical field to two adjacent transistor gates in parallel to see which one has the higher quantum tunneling current. A higher current that occurs first is due to more dangling bonds. By repeating this process for many pairs of transistor gates, we can create a PUF random number since we never know where we will see the high quantum tunneling current among the two gates. This is like tossing a coin, the chances of heads and tails is 50%. In addition, the dangling bonds of silicon or oxygen cannot be re-healed easily at temperature below 700°C. The tunneling current of the structure will remain over the lifetime of the devices. The microstructure changes in the oxide property cannot be detected using FIB (Focused Ion Beam) on SEM (scanning electron microscope) or TEM (Transmission electron microscopy) samples. This undetectable feature makes the secret in this PUF is physically untraceable. Consequently, this PUF meets the four important characteristics of an ideal PUF. Thus, compared to SRAM PUF, the value of a NeoPUF is unlikely affected by environmental conditions or physical aging issues. Furthermore, PUFsecurity developed a PUF-based true random number generator which is adapted from NeoPUF and has passed the full NIST 800-22 test. The NeoPUF is also silicon proven and meets an outstanding reliability performance of 0 error-bit-rate. In addition, NeoPUF also demonstrates impressive statistic results in Hamming Weight and Hamming Distance, which indicate the ideal randomness and uniqueness.
*Reference: Wu, M. Y., Yang, T. H., Chen, L. C., Lin, C. C., Hu, H. C., Su, F. Y., … & Yang, E. C. S. (2018, February). A PUF scheme using competing oxide rupture with bit error rate approaching zero. In 2018 IEEE International Solid-State Circuits Conference-(ISSCC) (pp. 130-132). IEEE. **Reference: Claes M., van der Leest V., Braeken A. (2012) Comparison of SRAM and FF PUF in 65nm Technology. In: Laud P. (eds) Information Security Technology for Applications. NordSec 2011. Lecture Notes in Computer Science, vol 7161. Springer, Berlin, Heidelberg ***Reference: R. Maes, V. Rozic, I. Verbauwhede, P. Koeberl, E. van der Sluis and V. van der Leest, “Experimental evaluation of Physically Unclonable Functions in 65 nm CMOS,” 2012 Proceedings of the ESSCIRC (ESSCIRC), Bordeaux, 2012, pp. 486-489. Usage of PUF: Take NeoPUF as an Example Not only does NeoPUF have advantages with its robust performance, its usage is widespread too. For example:
For more information, please visit www.pufsecurity.com and www.ememory.com.tw
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