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Clear Shape and UMC Release DFM-Driven Design FlowFlow Focuses on Systematic Variation Impact on Catastrophic and Parametric Issues SANTA CLARA, Calif. and HSINCHU, Taiwan, November 27, 2006 - Clear Shape Technologies, Inc., a leader in variability-aware analysis and optimization solutions, and UMC (NYSE: UMC; TSE: 2303), a leading global semiconductor foundry, announced today that their 18 month DFM collaboration efforts have resulted in the availability of DFM-aware IC design flows. The relationship has been focused on enabling designers to quickly and accurately control and optimize the impact of systematic variations on design parameters and yield. The DFM-driven nanometer IC design flow enables designers to perform yield and parametric hotspot detection and repair by utilizing Clear Shape's flagship product InShapeTM, a fast full-chip design manufacturability checker, and OutPerformTM, a fast full-chip parametric variation analysis and optimization tool. These tools, combined with certified UMC technology files with encrypted DFM data, will result in a fast, accurate, model-based analysis and optimization approach. "Clear Shape's InShape design manufacturability checker, along with its OutPerform electrical DFM analysis and optimization product, are welcome additions to our comprehensive DFM yield optimization offerings that now target 65nm designs," said Patrick Lin, Chief SoC Architect, system & architecture support at UMC. "We are collaborating with best-in-class DFM providers to deliver standard-cell libraries, SPICE models and design flows to provide users with yield-enhancing knowledge throughout the design and manufacturing stages." UMC's initial collaboration with Clear Shape has demonstrated very accurate results -that are fast enough to be used during place and route. These solutions are slated to be available to UMC's customers later this year. "Clear Shape and UMC have been working closely together to address the uncertainties introduced by systematic variability on IC design," said Atul Sharan, President and CEO of Clear Shape. "It is our privilege to work with UMC to develop a closed-loop electrical DFM solution where fabless semiconductor companies can predict and address potential parametric and yield issues through access to UMC's manufacturing information in a fast, accurate model-based format." About InShape and OutPerform OutPerformTM is the first electrical DFM analysis and optimization product to control and optimize the impact of systematic variability on designers' chip parameters using fab manufacturing data, capturing the effects of RET, OPC, CMP, mask, etch and lithography on both device and interconnect. OutPerform takes in designers' physical design and timing data, along with encrypted fab technology files and critical dimension (CD) data from silicon contour shapes predicted by InShape across the process window, and automatically produces a DFM electrical hotspot report for timing and leakage power. OutPerform also creates optimization directives for timing that can be input to the designers' place and route or layout tool. About Clear Shape About UMC
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