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Mentor Graphics and TSMC Provide TSMC-Qualified Process Design Kit for 0.13 micron Mixed-Mode and RF DesignWILSONVILLE, Ore. -- November 30, 2006 -- Mentor Graphics Corporation (Nasdaq: MENT) today announced that in a joint effort with Taiwan Semiconductor Manufacturing Company (NYSE: TSM), TSMC is releasing foundry-qualified process design kits (Mentor-PDKs) that support Mentor’s entire custom/mixed-signal IC design flow. TSMC has long been providing foundry-qualified design rule check (DRC), layout versus schematic (LVS), and parasitic extraction rule decks qualified for the Mentor Graphics Calibre® platform, as well as Spice models for Mentor’s Eldo® Spice simulator. Starting with this latest release of the 0.13µ (micron) mixed-mode and RF Mentor-PDK for TSMC’s CM013RG process, TSMC now supports the entire Mentor Graphics ICstudio custom/mixed-signal IC design flow. This kit includes symbol library for Design Architect®-IC schematic capture and parameterized layout generators for IC Station® layout editor. This complete Mentor-PDK has been pre-qualified with the TSMC process. Design kits for the 90nm (nanometer) and 65nm nodes are currently being developed. “We are pleased with the result of this collaboration between TSMC and Mentor Graphics in the development and validation of the Mentor process design kit,” said Ed Wan, Senior Director of Product Marketing and Design Services at TSMC. “With the release of qualified process design kits such as this, IC designers will be able to leverage the readiness of our leading-edge analog mixed-signal and RF technologies more efficiently and effectively. This in turn can help them jump start their design activities quickly and confidently.” Among many users of this CM013RG Mentor-PDK is MediaPhy, a fabless semiconductor company developing next-generation System-on-Chip solutions for global mobile media applications. MediaPhy has been an early adopter of this kit since its alpha and beta stages. “We have been working closely with Mentor Graphics and TSMC through the early development stages to address our ever-increasing requirements for mixed-signal and RF designs,” said Mohammad Moradi, co-founder and VP of engineering at MediaPhy. “Being able to receive collaborative support from both Mentor and TSMC has made this design kit a center piece of our advanced design methodology. We are pleased to see its official offering from TSMC that gives added confidence and benefits not only to us, but to the greater IC design community.” “The partnership between TSMC and Mentor has long supported chip designers in their quest to complete designs efficiently. I am pleased to see this collaboration elevated to the next level.” said Jue-Hsien Chern, vice president and general manager, Deep Submicron (DSM) division, Mentor Graphics. “With the support of Mentor-PDKs and Eldo/ADMS Views, we are enabling our common customers to design in TSMC's leading nanometer technologies.” New Mentor ICstudio Design Platform About the new 0.13µ Mixed-Mode RF design kit: Availability About TSMC About Mentor Graphics
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